We developed an extreme ultraviolet EUV polarimeter, which employs laser-generated high-order harmonics as the light source. This relatively high-flux directional EUV source has available wavelengths between 8 nm and 62 nm and easily rotatable linear polarization. This first-time workhorse application of laser high harmonics enables polarization-sensitive reflection measurements not previously available in the EUV. We have constructed a versatile positioning system that places harmonics on the microchannel plate detector with an accuracy of 0. We have demonstrated that reflectance as low as 0.
Key Challenges in EUV Mask Technology: Actinic Mask Inspection and Mask 3D Effects
"Improvement of Ultraviolet Digital Image Correlation (UV-DIC) at Extre" by Thinh Quang Thai
A time-resolving spectrograph was developed to study the extreme ultraviolet emissions of tokamak plasmas. The spectrograph incorporates a detector system with detecting elements to record the entire spectrum in the A range every 3. Multiple gratings are used to achieve either high dispersion, for good resolution, or low dispersion, for wide spectral coverage. The survey properties of the spectrograph were used to compare the impurity contents of these two machines, and to study conditions affecting the normal evolution of tokamak discharges. Impurity injection, involving the rapid vaporization of a metal film by a laser pulse, is a common technique used to study impurity behavior.
Optical Design: from Extreme Ultraviolet Lithography to Thermo-Photovoltaics
This study reports on the physical and optical characterization of scandium oxide thin films. Thin films of scandium oxide, nm thick, were deposited on silicon wafers, quartz slides, and silicon photodiodes by reactively sputtering scandium in an oxygen environment. These samples were characterized using ellipsometry, high-resolution transmission electron microscopy, scanning transmission electron microscopy, and energy dispersive x-ray analysis. In these measurements, a new method for data collection was used, in which the reflection and transmission data were collected simultaneously. Analysis of the EUV reflection and transmission data was performed using a front-side reflection, matrix-multiplication technique, which is novel among EUV analytical practice.
Extreme temperature has increasingly played an essential role in design and operation of various engineering applications including spacecraft re-entry, hypersonic flight, next-generation nuclear reactors, and hot-fire rocket testing. To protect instruments against the harsh environments, it is preferable to use non-contacting measurements when monitoring the integrity of those mechanical structures. Digital Image Correlation DIC is a popular method which uses digital cameras in order to track motion thanks to images acquired before and after deformation. Displacements and strains are plotted over a full-field region which is conducive to identify highly risky zones.